摘要An n-ZnS/p-Si heterojunction was fabricated by using the rf magnetron sputtering method. The band gap of the ZnS film is about 3.63 eV. Current-voltage (I–V) characteristics of the ZnS/Si heterojunction are examined and the results show the distinct rectifying characteristics with a turn-on voltage of about 1.8 V. The UV (330 nm) and visible (450 nm) photoresponse properties of the heterojunction are also investigated, which demonstrates the potential of such an n-ZnS/p-Si heterojunction for detecting both UV and visible light.
Abstract:An n-ZnS/p-Si heterojunction was fabricated by using the rf magnetron sputtering method. The band gap of the ZnS film is about 3.63 eV. Current-voltage (I–V) characteristics of the ZnS/Si heterojunction are examined and the results show the distinct rectifying characteristics with a turn-on voltage of about 1.8 V. The UV (330 nm) and visible (450 nm) photoresponse properties of the heterojunction are also investigated, which demonstrates the potential of such an n-ZnS/p-Si heterojunction for detecting both UV and visible light.
[1] Van de Walle C G 2000 Phys. Rev. Lett. 85 1012
[2] Mridha S and Basak D 2007 J. Appl. Phys. 101 083102
[3] Ryu Y R, Lee T S, Lubguban J A, White H W, Park Y S and Youn C J 2005 Appl. Phys. Lett. 87 153504
[4] Xu L, Wang R, Liu Y and Dong L 2011 Chin. Phys. Lett. 28 040701
[5] Zheng X J, Chen Y Q, Zhang T, Yang B, Jiang C B, Yuan B and Zhu Z 2010 Sensors and Actuators B 147 442
[6] Sooklal K, Cullum B S, Angel S M and Murphy C J 1996 J. Phys. Chem. 100 4551
[7] Gayou V L, Salazar-Hernandez B and Constantino M E 2010 Vacuum 84 1191
[8] Xin Z J, Peaty R J, Rutt H N and Eason R W 1999 Semicond. Sci. Technol. 14 695
[9] Fang J, Holloway H P, Yu E J, Jones S K, Pathangey B and Brettschneider E 1993 Appl. Surf. Sci. 70-71 701
[10] Tauc J J 1976 Amorphous and Liquid Semiconductor (New York: Plenum) p 193
[11] Gokarna A, Pavaskar N R, Sathaye S D, Ganesan V and Bhoraskar S V 2002 J. Appl. Phys. 92 2118
[12] Ryu Y R, Lee T S, Leem J H and White H W 2003 Appl. Phys. Lett. 83 4032
[13] Mandalapu L J, Yang Z, Xiu F X, Zhao D T and Liu J L 2006 Appl. Phys. Lett. 88 092103
[14] Jeong I S, Kim J H, Park H H and Im S 2004 Thin Solid Films 447-448 111