摘要Transparent conductive Al-doped ZnO (AZO) thin films are prepared on normal glass substrates by the sol-gel spin coating method. The effects of drying conditions, annealing temperature and cooling rate on the structural, electrical and optical properties of AZO films are investigated by x-ray diffraction, scanning electron microscopy, the four-point probe method and UV-VIS spectrophotometry, respectively. The deposited films show a hexagonal wurtzite structure and high preferential c-axis orientation. As the drying temperature increases from 100°C to 300°C the resistivity of AZO films decreases dramatically. In contrast to the annealed films cooled in a furnace and in air, the resistivity of the annealed film which is cooled at -15°C is greatly reduced. Increasing the cooling rate dramatically increases the electrical conductivity of AZO films.
Abstract：Transparent conductive Al-doped ZnO (AZO) thin films are prepared on normal glass substrates by the sol-gel spin coating method. The effects of drying conditions, annealing temperature and cooling rate on the structural, electrical and optical properties of AZO films are investigated by x-ray diffraction, scanning electron microscopy, the four-point probe method and UV-VIS spectrophotometry, respectively. The deposited films show a hexagonal wurtzite structure and high preferential c-axis orientation. As the drying temperature increases from 100°C to 300°C the resistivity of AZO films decreases dramatically. In contrast to the annealed films cooled in a furnace and in air, the resistivity of the annealed film which is cooled at -15°C is greatly reduced. Increasing the cooling rate dramatically increases the electrical conductivity of AZO films.
[1] Gordillo G and Calderon C 2001 Solar Energy Mater.Solar Cells 69 251 [2] Zhou Y, Kelly P J, Postill A et al 2004 Thin SolidFilms 447--448 33 [3] Minami T, Miyata T, Ihara K et al 2006 Thin SolidFilms 494 47 [4] Fu Z, Lin B and Zu J 2002 Thin Solid Films 402302 [5] Lee J H and Park B O 2004 Mater. Sci. Eng. B 106 242 [6] Musat V, Teixeira B, Fortunato E et al 2006 ThinSolid Films 502 219 [7] Mridha S and Basak D 2007 J. Phys. D 40 6902 [8] Lin J P and Wu J M 2008 Appl. Phys. Lett. 92134103 [9] Musat V, Teixeira B, Fortunato E et al 2004 Surf.Coat. Technol. 180--181 659 [10] Lee J H, Ko K H and Park B O 2003 J. Cryst. Growth 247 119 [11] Liu T Q, Sakurai O, Mizutani N et al 1986 J. Mater.Sci. 21 3698 [12] Ohyama M, Kozuka H, Yoko T et al 1996 J. Ceram. Soc.Jpn. 104 296 [13] Ohyama M, Kozuka H and Yoko T 1997 Thin Solid Films 306 78 [14] Ellmer K and Mientus R 2008 Thin Solid Films 516 4620 [15] Li Z H and Ren D Y 2006 Trans. Nonferrous Met. Soc.Chin. 16 1358 [16] Bao D H, Gu H S and Kuang A X 1998 Thin Solid Films 312 37
2009, Vol. 26 
