Investigation of Chemical-Vapour-Deposition Diamond Alpha-Particle Detectors
GU Bei-Bei, WANG Lin-Jun, ZHANG Ming-Long, XIA Yi-Ben
School of Materials Science and Engineering, Shanghai University, Shanghai 200072
Investigation of Chemical-Vapour-Deposition Diamond Alpha-Particle Detectors
GU Bei-Bei;WANG Lin-Jun;ZHANG Ming-Long;XIA Yi-Ben
School of Materials Science and Engineering, Shanghai University, Shanghai 200072
关键词 ：
85.30.De ,
81.15.Gh ,
29.40.Wk
Abstract ： Diamond films with [100] texture were prepared by a hot-filament chemical vapour deposition technique to fabricate particle detectors. The response of detectors to 5.5MeV241 Am particles is studied. The photocurrent increases linearly and then levels off with voltage, and 7nA is obtained at bias voltage of 100V. The time-dependent photocurrent initially increases rapidly and then tends to reach saturation. Furthermore, a little increase of the dark-current after irradiation can be accounted for by the release of the charges captured by the trapping centres at low energy levels during irradiation. An obvious peak of the pulse height distribution can be observed, associated with the energy of 5.5MeV.
Key words ：
85.30.De
81.15.Gh
29.40.Wk
出版日期: 2004-10-01
:
85.30.De
(Semiconductor-device characterization, design, and modeling)
81.15.Gh
(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
29.40.Wk
(Solid-state detectors)
引用本文:
GU Bei-Bei;WANG Lin-Jun;ZHANG Ming-Long;XIA Yi-Ben. Investigation of Chemical-Vapour-Deposition Diamond Alpha-Particle Detectors[J]. 中国物理快报, 2004, 21(10): 2051-2053.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2004/V21/I10/2051
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2004, Vol. 21 
