A Multiple Phase-Shifted Distributed Feedback (DFB) Laser Fabricated by Nanoimprint Lithography
ZUO Qiang1**, ZHAO Jian-Yi1, CHEN Xin1, WANG Zhi-Hao1, SUN Tang-You1, ZHOU Ning2, ZHAO Yan-Li1, XU Zhi-Mou1, LIU Wen1,2**
1Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 2Accelink Technologies Company, Ltd, Wuhan 430074
Abstract:Multiple phase-shifted (MPS) diffraction grating is an effective way proposed to overcome the spatial hole burning (SHB) effect in a distributed feedback (DFB) laser. We present two symmetric λ/8 phase-shifted DFB lasers by using nanoimprint lithography (NIL). The threshold current of a typical laser is less than 15 mA. The side mode suppression ratio (SMSR) is still above 42 dB even at 100 mA current injection. To show the versatility of NIL, eight different wavelength MPS-DFB lasers on this single chip are also demonstrated. Our results prove that NIL is a promising tool for fabricating high performance complex grating DFB lasers.