Direct Deposition of Polycrystalline Diamond Films on the Si( 100) Mirror Surface by Hot Filament Chemical Vapor Deposition
GAO Chunxiao, ZOU Guangtian, JIN Zengsun
State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
Direct Deposition of Polycrystalline Diamond Films on the Si( 100) Mirror Surface by Hot Filament Chemical Vapor Deposition
GAO Chunxiao;ZOU Guangtian;JIN Zengsun
State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
关键词 ：
81.15.Gh ,
81.40.-z ,
61.50.Cj
Abstract ： High quality diamond films have been deposited on Si(100) mirror surface without using any surface pretreatment such as abrasive diamond scratching, diamond-like carbon predeposition or oil treatment. The experiments are carried out in the hot filament chemical vapour deposition system by using the mixture of methane, hydrogen and oxygen. The films show the well-defined facets and are confirmed by Raman spectroscopy and scanning electron microscopy to be high quality diamond films. In this deposition process, higher substrate temperature, high filament temperature and oxygen addition play the important roles in diamond nucleation on the mirror-smooth Si(100) surface.
Key words ：
81.15.Gh
81.40.-z
61.50.Cj
出版日期: 1994-05-01
:
81.15.Gh
(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
81.40.-z
(Treatment of materials and its effects on microstructure, nanostructure, And properties)
61.50.Cj
引用本文:
GAO Chunxiao;ZOU Guangtian;JIN Zengsun. Direct Deposition of Polycrystalline Diamond Films on the Si( 100) Mirror Surface by Hot Filament Chemical Vapor Deposition
[J]. 中国物理快报, 1994, 11(5): 317-320.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1994/V11/I5/317
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