Determination of Oxidation States in Magnetic Multilayers
YU Guang-Hua1,2, LI Ming-Hua1,2, ZHU Feng-Wu1, CHAI Chun-Lin2,3, LAI Wu-Yan2
1Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
Determination of Oxidation States in Magnetic Multilayers
1Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
Abstract： X-ray photoelectron spectroscopy has been used to characterize the oxidation states in Ta/NiOx/Ni81Fe19/Ta magnetic multilayers prepared by rf reaction and dc magnetron sputtering. The exchange coupling field and the coercivity of NiOx/Ni81Fe19 are studied as a function of the ratio of Ar to O2 during the deposition process. The chemical states of Ni atoms in the interface region of NiOx/NiFe were also investigated by XPS and the peak decomposition technique. The results show that the ratio of Ar to O2 has a great effect on the chemical states of nickel in NiOx films. Thus the exchange coupling field and the coercivity of Ta/NiOx/Ni81Fe19/Ta are affected seriously. Also, the experiment shows that XPS is a powerful tool in characterizing magnetic multilayers.
(Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.))
引用本文:
YU Guang-Hua;LI Ming-Hua;ZHU Feng-Wu;CHAI Chun-Lin;LAI Wu-Yan. Determination of Oxidation States in Magnetic Multilayers[J]. 中国物理快报, 2002, 19(2): 266-268.
YU Guang-Hua, LI Ming-Hua, ZHU Feng-Wu, CHAI Chun-Lin, LAI Wu-Yan. Determination of Oxidation States in Magnetic Multilayers. Chin. Phys. Lett., 2002, 19(2): 266-268.
2002, Vol. 19 
