Effects of Rapid Recurrent Thermal Annealing on Giant Magnetoresistance NiFe/Ag Multilayers
WEN Qi-Ye, ZHANG Huai-Wu, JIANG Xiang-Dong, TANG Xiao-Li, ZHANG Wan-Li
School of Micro-Electronic and Solid-electronic, University
of Electronic Science and Technology of China, Chengdu 610054
Effects of Rapid Recurrent Thermal Annealing on Giant Magnetoresistance NiFe/Ag Multilayers
WEN Qi-Ye;ZHANG Huai-Wu;JIANG Xiang-Dong;TANG Xiao-Li;ZHANG Wan-Li
School of Micro-Electronic and Solid-electronic, University
of Electronic Science and Technology of China, Chengdu 610054
关键词 ：
75.70.Pa ,
75.60.Nt ,
75.70.Cn
Abstract ： NiFe/Ag multilayers were prepared by dc sputtering onto glass-ceramic substrates directly at room temperature. The samples were thermally processed by rapid recurrent thermal anneal (RRTA). We studied the effects of RRTA on giant magnetoresistance (GMR) NiFe/Ag multilayer by controlling the anneal temperature as well as the rapid anneal cycle. The samples after three RRTA cycles have a similar annealing temperature dependence of GMR responses to the ordinary annealed samples. With the increasing anneal cycle, the GMR response improved at first and then reached an unexpected high value of 9% before descent rapidly. Microstructure study shows that this effect is ascribed to the transformation of continuous NiFe layer into discontinuous one, and then into a granular like film in a step-by-step way.
Key words ：
75.70.Pa
75.60.Nt
75.70.Cn
出版日期: 2003-12-01
:
75.70.Pa
75.60.Nt
(Magnetic annealing and temperature-hysteresis effects)
75.70.Cn
(Magnetic properties of interfaces (multilayers, superlattices, heterostructures))
引用本文:
WEN Qi-Ye;ZHANG Huai-Wu;JIANG Xiang-Dong;TANG Xiao-Li;ZHANG Wan-Li. Effects of Rapid Recurrent Thermal Annealing on Giant Magnetoresistance NiFe/Ag Multilayers[J]. 中国物理快报, 2003, 20(12): 2242-2245.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2003/V20/I12/2242
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2003, Vol. 20 
