Atomic-Scale Kinetic Monte Carlo Simulation of {100}-Oriented Diamond Film Growth in C-H and C-H-Cl Systems by Chemical Vapor Deposition
AN Xi-Zhong1, ZHANG Yu2, LIU Guo-Quan1, QIN Xiang-Ge1, WANG Fu-Zhong1, LIU Sheng-Xin1
1School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083
2School of Applied Science, University of Science and Technology Beijing, Beijing 100083
Atomic-Scale Kinetic Monte Carlo Simulation of {100}-Oriented Diamond Film Growth in C-H and C-H-Cl Systems by Chemical Vapor Deposition
AN Xi-Zhong1;ZHANG Yu2;LIU Guo-Quan1;QIN Xiang-Ge1;WANG Fu-Zhong1;LIU Sheng-Xin1
1School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083
2School of Applied Science, University of Science and Technology Beijing, Beijing 100083
Abstract： We simulate the {100}-oriented diamond film growth of chemical vapor deposition (CVD) under different models in C-H and C-H-Cl systems in an atomic scale by using the revised kinetic Monte Carlo method. The simulation results show that: (1) the CVD diamond film growth in the C-H system is suitable for high substrate temperature, and the film surface roughness is very coarse; (2) the CVD diamond film can grow in the C-H-Cl system either at high temperature or at low temperature, and the film quality is outstanding; (3) atomic Cl takes an active role for the growth of diamond film, especially at low temperatures. The concentration of atomic Cl should be controlled in a proper range.
AN Xi-Zhong;ZHANG Yu;LIU Guo-Quan;QIN Xiang-Ge;WANG Fu-Zhong;LIU Sheng-Xin. Atomic-Scale Kinetic Monte Carlo Simulation of {100}-Oriented Diamond Film Growth in C-H and C-H-Cl Systems by Chemical Vapor Deposition[J]. 中国物理快报, 2002, 19(7): 1019-1020.
AN Xi-Zhong, ZHANG Yu, LIU Guo-Quan, QIN Xiang-Ge, WANG Fu-Zhong, LIU Sheng-Xin. Atomic-Scale Kinetic Monte Carlo Simulation of {100}-Oriented Diamond Film Growth in C-H and C-H-Cl Systems by Chemical Vapor Deposition. Chin. Phys. Lett., 2002, 19(7): 1019-1020.
2002, Vol. 19 
