中国物理快报  2019, Vol. 36 Issue (6): 67301-    DOI: 10.1088/0256-307X/36/6/067301
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Improvement of Performance of HfS$_{2}$ Transistors Using a Self-Assembled Monolayer as Gate Dielectric
Wen-Lun Zhang**
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan