Structure and Tribological Property of TiBN Nanocomposite Multilayer Synthesized by Ti-BN Composite Cathode Plasma Immersion Ion Implantation and Deposition
Wen-Quan Lv1 , Lang-Ping Wang1** , Yong-Zhi Cao2** , Zhi-Wei Gu1 , Xiao-Feng Wang1 , Yong-Da Yan2 , Fu-Li Yu2
1 State Key Laboratory of Advanced Welding & Joining, Harbin Institute of Technology, Harbin 1500012 Centre for Precision Engineering, Harbin Institute of Technology, Harbin 150001
Abstract ：A Ti-BN complex cathode is made from Ti and h-BN powders by the powder metallurgy technology, and TiBN coating is obtained by plasma immersion ion implantation and deposition with this Ti-BN composite cathode. The TiBN coating shows a self-forming multilayered nanocomposite structure while with relative uniform elemental distributions. High resolution transmission electron microscopy images reveal that the multilayered structure is derived from different grain sizes in the nanocomposite. Due to the existence of h-BN phase, the friction coefficient of the coating is about 0.25.
收稿日期: 2016-03-30
出版日期: 2016-09-30
:
52.77.Dq
(Plasma-based ion implantation and deposition)
52.80.-s
(Electric discharges)
52.40.-w
(Plasma interactions (nonlaser))
52.80.Vp
(Discharge in vacuum)
引用本文:
. [J]. 中国物理快报, 2016, 33(09): 95201-095201.
链接本文:
https://cpl.iphy.ac.cn/CN/10.1088/0256-307X/33/9/095201
或
https://cpl.iphy.ac.cn/CN/Y2016/V33/I09/95201
[1] Shafi H Z, Matin A, Khan Z, Karen K and Gleason K K 2015 Surf. Coat. Technol. 279 171 [2] Voevodin A A, Waite A R, Bultman J E, Hu J J and Muratore C 2015 Surf. Coat. Technol. 280 260 [3] Ward L P, Purushotham K P and Manory R R 2016 Nucl. Instrum. Methods Phys. Res. Sect. B 368 37 [4] Vep?ek S and Reiprich S 1995 Thin Solid Films 268 64 [5] Barletta M, Pezzola S, Puopolo M, Tagliaferri V and Vesco S 2014 Mater. Des. 54 924 [6] Wilson J C A B, Wu S, Gotman I, Housden J and Gutmanas E Y 2015 Mater. Lett. 157 45 [7] Bouzakis K D, Bouzakis E, Kombogiannis S and Makrimallakis S 2014 CIRP J. Manuf. Sci. Technol. 7 264 [8] Bouzakis K D, Hadjiyiannis S, Skordaris G and Anastopoulos J 2003 Surf. Coat. Technol. 174 393 [9] Wang T Zhang G and Jiang B 2016 Appl. Surf. Sci. 363 217 [10] Moghadam R Z, Ahmadvand H and Jannesari M 2016 Infrared Phys. Technol. 75 18 [11] Stueber M, Holleck H, Leiste H, Ulrich S and Ziebert C 2009 J. Alloys Compd. 483 321 [12] Lu Y Y, Kotoka R, Ligda J P, Schuster B E and Wei Q 2015 Surf. Coat. Technol. 275 142 [13] Callisti M, Lozano-Perez S and Polcar T 2016 Mater. Lett. 163 138 [14] Zhang P, Fang Y, Dai S Fu Y B, Zhang M X, Huang M and Hu J L 2016 Mater. Lett. 173 35 [15] Wang L P, Huang L, Xie Z W, Wang X F and Tang B Y 2008 Rev. Sci. Instrum. 79 023306 [16] Liu H X, Zhang X, Jiang Y and Zhou R 2016 J. Alloys Compd. 670 268 [17] Wang Y K, Wang W M, Gu X H Li B S, Xia L F and Lei T Q 1994 Mater. Prot. 27 13 (in Chinese) [18] Sun H T, Wang X P, Kou Z Q, Wang L J, Wang J Y and Sun Y Q 2015 Chin. Phys. B 24 047701 [19] Xie Z W, Wang L P, Wang X F, Lu Y, Hang L and Yan J C 2012 Nucl. Instrum. Methods Phys. Res. Sect. B 271 1 [20] Yang M, Xu J G, Song H Y and Zhang Y G 2015 Chin. Phys. B 24 096202
[1]
.
[2]
LIU Cheng-Sen;WANG De-Zhen;FAN Yu-Jia;ZHANG Nan;GUAN Li;YAO Yuan. Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation
[3]
GAO Peng;XU Jun;DING Wan-Yu;DONG Chuang. Ultra-Thin Silicon Carbon Nitride Film: a Promising Protective Coating for Read/Write Heads in Magnetic Storage Devices
[4]
LIU Yuan-Fu;;DENG Fu-Ping;HAN Jian-Min;XU Xiang-Yang;YANG Si-Ze;LIU Xiu-Bo. (Ti,Al)N Film on Normalized T8 Carbon Tool Steel Prepared by Pulsed High Energy Density Plasma Technique
[5]
LIU Yuan-Fu;HAN Jian-Min;ZHANG Gu-Ling;WANG Jiu-Li;YANG Si-Ze. Microstructure and Wear Behaviour of WC Film Prepared by Pulsed High Energy Density Plasma
[6]
DING Wan-Yu;XU Jun;PIAO Yong;LI Yan-Qin;GAO Peng;DENG Xin-Lu;DONG Chuang. Deposition of Hydrogen-Free Silicon Nitride Thin Films by Microwave ECR plasma Enhanced Magnetron Sputtering at Room Temperature
[7]
JIANG Nan;CHEN Han-Yuan;QIAN Sheng-Fa. A Novel Reactive Gas Source and Its Application to Carbon Nanotube Film Deposition
[8]
LIU Tian-Wei;DENG Xin-Lu;WAN Xiao-Ying;WANG Ying-Min;ZOU Jian-Xin;DONG Chuang. Structures and Properties of Zr--N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N2 Partial Pressures
[9]
MAO Ming;WANG You-Nian. Influence of External Magnetic Field on Anomalous Skin Effects in Inductively Coupled Plasmas
[10]
LI Xue-Chun;WANG You-Nian. Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates
[11]
LI Xin;TANG Zhen-An;MA Guo-Ja;WU Zhi-Meng;Deng Xin-Lu. Preparation of Diamond-Like Carbon Films in Methane by Electron Cyclotron Resonance Microwave Plasma Source Ion Implantation
[12]
WANG Jiu-Li;ZHANG Gu-Ling;FAN Song-Hua;YANG Wu-Bao;YANG Si-Ze;. Pulsed Ion-Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid-Enhanced Plasma Source Ion Implantation
[13]
GONG Xue-Yu;X. R. Duan;H. Lange;A. A. Meyer-Plath. Detection of NH2 Radical in Ammonia Radio-Frequency Plasmas by Laser-Induced Resonance Fluorescence
2016, Vol. 33 
