Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates
LI Xue-Chun, WANG You-Nian
State Key Laboratory of Materials Modification, Department of Physics, Dalian University of Technology, Dalian 116023
Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates
LI Xue-Chun;WANG You-Nian
State Key Laboratory of Materials Modification, Department of Physics, Dalian University of Technology, Dalian 116023
关键词 ：
52.40.Kh ,
52.65.Yy ,
52.77.Dq
Abstract ： Using a dynamic sheath model, we have studied the secondary-electron emission effects at one-dimensional planar dielectric surface in plasma immersion ion implantation. The temporal evolution of the sheath thickness, the surface potential of dielectric, and the ions dose accumulated on the dielectric surface are obtained. The numerical results demonstrate that the charging effects is greatly enhanced by the secondary electron emission effects, so the sheath thickness becomes thinner, the surface potential of dielectric decreases fast and the ions dose accumulated on the dielectric surface significantly increases.
Key words ：
52.40.Kh
52.65.Yy
52.77.Dq
出版日期: 2004-02-01
:
52.40.Kh
(Plasma sheaths)
52.65.Yy
(Molecular dynamics methods)
52.77.Dq
(Plasma-based ion implantation and deposition)
引用本文:
LI Xue-Chun;WANG You-Nian. Secondary-Electron Emission Effects in Plasma Immersion Ion Implantation with Dielectric Substrates[J]. 中国物理快报, 2004, 21(2): 364-366.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2004/V21/I2/364
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2004, Vol. 21 
