中国物理快报  2004, Vol. 21 Issue (10): 2008-2011    
  Original Articles 本期目录 | 过刊浏览 | 高级检索 |
Structures and Properties of Zr--N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N2 Partial Pressures
LIU Tian-Wei1,2, DENG Xin-Lu1, WAN Xiao-Ying2, WANG Ying-Min1, ZOU Jian-Xin1, DONG Chuang1
1State Key Laboratory of Materials Modification, Dalian University of Technology, Dalian 116024 2China Academy of Engineering Physics, Mianyang 621900
Structures and Properties of Zr--N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N2 Partial Pressures
LIU Tian-Wei1,2;DENG Xin-Lu1;WAN Xiao-Ying2;WANG Ying-Min1;ZOU Jian-Xin1;DONG Chuang1
1State Key Laboratory of Materials Modification, Dalian University of Technology, Dalian 116024 2China Academy of Engineering Physics, Mianyang 621900