Microstructure and Wear Behaviour of WC Film Prepared by Pulsed High Energy Density Plasma
LIU Yuan-Fu1, HAN Jian-Min1, ZHANG Gu-Ling2, WANG Jiu-Li2, YANG Si-Ze2
1Institute of Materials Science and Engineering, Beijing Jiaotong University, Beijing 100044
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Microstructure and Wear Behaviour of WC Film Prepared by Pulsed High Energy Density Plasma
LIU Yuan-Fu1;HAN Jian-Min1;ZHANG Gu-Ling2;WANG Jiu-Li2;YANG Si-Ze2
1Institute of Materials Science and Engineering, Beijing Jiaotong University, Beijing 100044
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Abstract： A super hard and wear resistant WC film is in-situ prepared on a 0.45% C steel substrate by pulsed high energy density plasma technique at ambient temperature. The microstructure and composition of the film are analysed by x-ray diffraction, x-ray photoelectron spectroscopy, Auger electron spectroscopy and scanning electron microscopy. The hardness profile and tribological behaviour of the film are determined with nano-indenter and wear tester, respectively. The results show that the microstructure of the film was dense and uniform and mainly composed of WC and a small amount of W2C. A wide mixing interface exists between the film and the 0.45%C steel substrate. The thickness of the film is about 2μm. The hardness and Yang’s modulus of the film are very high. The film has excellent wear resistance and low friction coefficient under dry sliding wear test conditions.
LIU Yuan-Fu;HAN Jian-Min;ZHANG Gu-Ling;WANG Jiu-Li;YANG Si-Ze. Microstructure and Wear Behaviour of WC Film Prepared by Pulsed High Energy Density Plasma[J]. 中国物理快报, 2005, 22(12): 3126-3129.
LIU Yuan-Fu, HAN Jian-Min, ZHANG Gu-Ling, WANG Jiu-Li, YANG Si-Ze. Microstructure and Wear Behaviour of WC Film Prepared by Pulsed High Energy Density Plasma. Chin. Phys. Lett., 2005, 22(12): 3126-3129.
2005, Vol. 22 
