Pulsed Ion-Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid-Enhanced Plasma Source Ion Implantation
WANG Jiu-Li1, ZHANG Gu-Ling1, FAN Song-Hua1, YANG Wu-Bao1, YANG Si-Ze1,2,3
1Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2State Key Laboratory of Physical Chemistry at the Solid Surfaces, Xiamen University, Xiamen 361005
3State Key Laboratory for Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116024
Pulsed Ion-Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid-Enhanced Plasma Source Ion Implantation
WANG Jiu-Li1;ZHANG Gu-Ling1;FAN Song-Hua1;YANG Wu-Bao1;YANG Si-Ze1,2,3
1Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2State Key Laboratory of Physical Chemistry at the Solid Surfaces, Xiamen University, Xiamen 361005
3State Key Laboratory for Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116024
Abstract： Based on our recently proposed grid-enhanced plasma source
ion implantation (GEPSII) technique for inner surface modification of materials with cylindrical geometry, we present the corresponding theoretical studies of the temporal evolution of the plasma ion sheath between the grid electrode and the target in a cylindrical bore. Typical results such as the ion sheath evolution, time-dependent ion density and time-integrated ion energy distribution at the target are calculated
by solving Poisson's equation coupled with fluid equations for
collisionless ions and Boltzmann assumption for electrons using finite difference methods. The calculated results can further verify the feasibility and superiority of this new technique.
WANG Jiu-Li;ZHANG Gu-Ling;FAN Song-Hua;YANG Wu-Bao;YANG Si-Ze;. Pulsed Ion-Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid-Enhanced Plasma Source Ion Implantation[J]. 中国物理快报, 2002, 19(10): 1473-1475.
WANG Jiu-Li, ZHANG Gu-Ling, FAN Song-Hua, YANG Wu-Bao, YANG Si-Ze,. Pulsed Ion-Sheath Dynamics in a Cylindrical Bore for Inner Surface Grid-Enhanced Plasma Source Ion Implantation. Chin. Phys. Lett., 2002, 19(10): 1473-1475.
2002, Vol. 19 
