GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR DEPOSITION
ZHAN Rujuan, GAO Kelin, ZOU Zuping, WANG Yanxia, LIU Jiezhou, XIANG Zhilin, LIU Hongtu1, WU Zhiqiang1, YE Jian1, ZHOU Guien2, WANG Changsui2
Department of Modern Physics University of Science and Technology of China, Hefei 230026
1Department of Physics University of Science and Technology of China, Hefei 230026
2Structure Research Laboratory. University of Science and Technology of China, Hefei 230026
GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR DEPOSITION
Department of Modern Physics University of Science and Technology of China, Hefei 230026
1Department of Physics University of Science and Technology of China, Hefei 230026
2Structure Research Laboratory. University of Science and Technology of China, Hefei 230026
Abstract： Diamond-like films have been deposited by dc plasma chemical vapor deposition (CVD). During deposition, the characteristics of the plasma have been measured by means of the Langmuir single probe. The structure of the deposits has been studied by X-ray diffraction, Raman spectroscopy and Fourier transform infrared spectroscopy.
ZHAN Rujuan;GAO Kelin;ZOU Zuping;WANG Yanxia;LIU Jiezhou;XIANG Zhilin;LIU Hongtu;WU Zhiqiang;YE Jian;ZHOU Guien;WANG Changsui. GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR DEPOSITION[J]. 中国物理快报, 1990, 7(10): 445-448.
ZHAN Rujuan, GAO Kelin, ZOU Zuping, WANG Yanxia, LIU Jiezhou, XIANG Zhilin, LIU Hongtu, WU Zhiqiang, YE Jian, ZHOU Guien, WANG Changsui. GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR DEPOSITION. Chin. Phys. Lett., 1990, 7(10): 445-448.
1990, Vol. 7 
