中国物理快报  2003, Vol. 20 Issue (8): 1312-1314    
  Original Articles 本期目录 | 过刊浏览 | 高级检索 |
Vertical and Smooth, etching of InP by Cl2/CH4/Ar Inductively Coupled Plasma at Room Temperature
SUN Chang-Zheng, ZHOU Jin-Bo, XIONG Bing, WANG Jian, LUO Yi
Department of Electronic Engineering, Tsinghua University, Beijing 100084
Vertical and Smooth, etching of InP by Cl2/CH4/Ar Inductively Coupled Plasma at Room Temperature
SUN Chang-Zheng;ZHOU Jin-Bo;XIONG Bing;WANG Jian;LUO Yi
Department of Electronic Engineering, Tsinghua University, Beijing 100084