Ion Cleaning of Facets for Improving the Reliability of High Power 980nm Semiconductor Lasers
SHU Xiong-Wen, XU Chen, TIAN Zeng-Xia, SHEN Guang-Di
Beijing Opto-electronic Technology Laboratory, Beijing University of Technology, Beijing 100022
Ion Cleaning of Facets for Improving the Reliability of High Power 980nm Semiconductor Lasers
SHU Xiong-Wen;XU Chen;TIAN Zeng-Xia;SHEN Guang-Di
Beijing Opto-electronic Technology Laboratory, Beijing University of Technology, Beijing 100022
关键词 ：
42.55.Px ,
42.79.Wc ,
52.77.Bn
Abstract ： We report a simple and available way of improving the reliability of high power InGaAs 980nm lasers by cleaning the facets using Ar ion before the protecting films have been coated. The Ar cleaning can remove the impurity and the oxide on the air-cleaved facets of laser diodes. It is proven that the way has marked effect on reducing the gradual degradation rate of laser diodes and improving the catastrophic--optical--damage threshold.
Key words ：
42.55.Px
42.79.Wc
52.77.Bn
出版日期: 2006-01-01
引用本文:
SHU Xiong-Wen;XU Chen;TIAN Zeng-Xia;SHEN Guang-Di. Ion Cleaning of Facets for Improving the Reliability of High Power 980nm Semiconductor Lasers[J]. 中国物理快报, 2006, 23(1): 124-125.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2006/V23/I1/124
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