Influence of Thickness on Field Emission Characteristics of Nanometer Boron Nitride Thin Films
GU Guang-Rui1,2 , LI Ying-Ai1 , TAO Yan-Chun3 , HE Zhi1 , LI Jun-Jie1 , YIN Hong1 , LI Wei-Qing1 , ZHAO Yong-Nian1,3
1 National Key Laboratory of Superhard Materials, Jilin University, Changchun 130023
2 College of Science and Engineering, Yanbian University, Yanji 133002
3 Key Laboratory for Supermolecular Structure and Spectroscopy, Jilin University, Changchun 130023
Influence of Thickness on Field Emission Characteristics of Nanometer Boron Nitride Thin Films
GU Guang-Rui1,2 ;LI Ying-Ai1 ;TAO Yan-Chun3 ;HE Zhi1 ;LI Jun-Jie1 ;YIN Hong1 ;LI Wei-Qing1 ;ZHAO Yong-Nian1,3
1 National Key Laboratory of Superhard Materials, Jilin University, Changchun 130023
2 College of Science and Engineering, Yanbian University, Yanji 133002
3 Key Laboratory for Supermolecular Structure and Spectroscopy, Jilin University, Changchun 130023
关键词 :
79.70.+q ,
81.15.Cd
Abstract : Nanometer boron nitride (BN) thin films with various thickness (54-135 nm) were prepared on Si(100) by rf magnetic sputtering physical vapor deposition. The field emission characteristics of the BN thin films were measured in an ultrahigh vacuum system. A threshold electric field of 11 V/μm and the highest emission current density of 24μA/cm2 at a electric field of 23 V/μm were obtained for the about 54-nm-thick BN film. The threshold electric field increases with the increase of the thickness in the nanometer range. The Fowler-Nordheim plots show that electrons were emitted from BN to vacuum by tunneling through the potential barrier at the surface of BN thin films.
Key words :
79.70.+q
81.15.Cd
出版日期: 2003-06-01
:
79.70.+q
(Field emission, ionization, evaporation, and desorption)
81.15.Cd
(Deposition by sputtering)
引用本文:
GU Guang-Rui;LI Ying-Ai;TAO Yan-Chun;HE Zhi;LI Jun-Jie;YIN Hong;LI Wei-Qing;ZHAO Yong-Nian;. Influence of Thickness on Field Emission Characteristics of Nanometer Boron Nitride Thin Films[J]. 中国物理快报, 2003, 20(6): 947-949.
GU Guang-Rui, LI Ying-Ai, TAO Yan-Chun, HE Zhi, LI Jun-Jie, YIN Hong, LI Wei-Qing, ZHAO Yong-Nian,. Influence of Thickness on Field Emission Characteristics of Nanometer Boron Nitride Thin Films. Chin. Phys. Lett., 2003, 20(6): 947-949.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2003/V20/I6/947
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