High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection
WU Wen-Juan1, ZHU Jing-Tao1, WANG Zhan-Shan1, ZHANG Zhong1, WANG Feng-Li1, WANG Hong-Chang1, ZHANG Shu-Min1, XU Yao1, CHENG Xin-Bin1, WANG Bei1, LI Cun-Xia1, WU Yong-Rong1, QIN Shu-Ji1, CHEN Ling-Yan1, ZHOU Hong-Jun2, HUO Tong-Lin2
1Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
2National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection
1Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
2National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
Abstract： The high reflectance orders are used to improve the spectral resolution of Mo/Si multilayers. The multilayers for the first-, second- and third-order reflectance are designed and optimized, respectively. These multilayers are fabricated by using a directed current magnetron sputtering system, and the reflectivity is measured in an extreme ultraviolet range by synchrotron radiation. The experimental results show that the spectral resolution λ/Δλ (λ=14nm) increases from 24.6 for the first order to 66.6 for the third order.
WU Wen-Juan;ZHU Jing-Tao;WANG Zhan-Shan;ZHANG Zhong;WANG Feng-Li;WANG Hong-Chang;ZHANG Shu-Min;XU Yao;CHENG Xin-Bin;WANG Bei;LI Cun-Xia;WU Yong-Rong;QIN Shu-Ji;CHEN Ling-Yan;ZHOU Hong-Jun;HUO Tong-Lin. High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection[J]. 中国物理快报, 2006, 23(9): 2534-2537.
WU Wen-Juan, ZHU Jing-Tao, WANG Zhan-Shan, ZHANG Zhong, WANG Feng-Li, WANG Hong-Chang, ZHANG Shu-Min, XU Yao, CHENG Xin-Bin, WANG Bei, LI Cun-Xia, WU Yong-Rong, QIN Shu-Ji, CHEN Ling-Yan, ZHOU Hong-Jun, HUO Tong-Lin. High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection. Chin. Phys. Lett., 2006, 23(9): 2534-2537.
2006, Vol. 23 
