Field Emission from Amorphous Carbon Nitride Films Deposited on Silicon Tip Arrays
LI Jun-Jie1,2, ZHENG Wei-Tao1, SUN Long2, BIAN Hai-Jiao1, JIN Zeng-Sun1, ZHAO Hai-Feng3, SONG-Hang3, MENG Song-He4, HE Xiao-Dong4, HAN Jie-Cai4
1National Key Laboratory of Superhard Materials and Department of Materials Science, Jilin University, Changchun 130023
2Department of Physics, School of Science and Engineering, Yanbian University, Yanji 133002
3Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130021
4Composite Research Center, Harbin Institute of Technology, Harbin 150006
Field Emission from Amorphous Carbon Nitride Films Deposited on Silicon Tip Arrays
LI Jun-Jie1,2;ZHENG Wei-Tao1;SUN Long2;BIAN Hai-Jiao1;JIN Zeng-Sun1;ZHAO Hai-Feng3;SONG-Hang3;MENG Song-He4;HE Xiao-Dong4;HAN Jie-Cai4
1National Key Laboratory of Superhard Materials and Department of Materials Science, Jilin University, Changchun 130023
2Department of Physics, School of Science and Engineering, Yanbian University, Yanji 133002
3Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130021
4Composite Research Center, Harbin Institute of Technology, Harbin 150006
Abstract： Amorphous carbon nitride films (a-CNx) were deposited on silicon tip arrays by rf magnetron sputtering in pure nitrogen atmosphere. The field emission property of carbon nitride films on Si tips was compared with that of carbon nitride on silicon wafer. The results show that field emission property of carbon nitride films deposited on silicon tips can be improved significantly in contrast with that on wafer. It can be explained that field emission is sensitive to the local curvature and geometry, thus silicon tips can effectively promote field emission property of a-CNx films. In addition, the films deposited on silicon tips have a smaller effective work function (F = 0.024 eV) of electron field emission than that on silicon wafer (F = 0.060 eV), which indicates a significant enhancement of the ability of electron field emission from a-CNx films.
LI Jun-Jie;ZHENG Wei-Tao;SUN Long;BIAN Hai-Jiao;JIN Zeng-Sun;ZHAO Hai-Feng;SONG-Hang;MENG Song-He;HE Xiao-Dong;HAN Jie-Cai. Field Emission from Amorphous Carbon Nitride Films Deposited on Silicon Tip Arrays[J]. 中国物理快报, 2003, 20(6): 944-946.
LI Jun-Jie, ZHENG Wei-Tao, SUN Long, BIAN Hai-Jiao, JIN Zeng-Sun, ZHAO Hai-Feng, SONG-Hang, MENG Song-He, HE Xiao-Dong, HAN Jie-Cai. Field Emission from Amorphous Carbon Nitride Films Deposited on Silicon Tip Arrays. Chin. Phys. Lett., 2003, 20(6): 944-946.
2003, Vol. 20 
