Electrical Characteristics of Copper Phthalocyanine Thin-Film Transistors with Polyamide-6/Polytetrafluoroethylene Gate Insulator
YU Shun-Yang1, XU Shi-Ai1, MA Dong-Ge2
1Key Laboratory of Chemicals Manufacture Engineering of Shandong Province, Yantai University, Yantai 2640052State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
Electrical Characteristics of Copper Phthalocyanine Thin-Film Transistors with Polyamide-6/Polytetrafluoroethylene Gate Insulator
YU Shun-Yang1;XU Shi-Ai1;MA Dong-Ge2
1Key Laboratory of Chemicals Manufacture Engineering of Shandong Province, Yantai University, Yantai 2640052State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
摘要Polyamide-6(PA 6)/polytetrafluoroethylene is studied as a potential gate dielectric for flexible organic thin film transistors. The same method used for the formation of organic semiconductor and gate dielectric films greatly simplifies the fabrication process of devices. The fabricated transistors show good electrical characteristics. Ambipolar behaviour is observed even when the device is operated in air.
Abstract:Polyamide-6(PA 6)/polytetrafluoroethylene is studied as a potential gate dielectric for flexible organic thin film transistors. The same method used for the formation of organic semiconductor and gate dielectric films greatly simplifies the fabrication process of devices. The fabricated transistors show good electrical characteristics. Ambipolar behaviour is observed even when the device is operated in air.
[1] Hu Y C, Dong G F, Wang L D, Liang Y and Qiu Y 2004 Chin. Phys.Lett. 21 723 [2] Nakanotani H, Yahiro M and Adachi C 2005 Appl. Phys.Lett. 90 262504 [3] Wang H B, Wang J, Yan X J, Shi J W, Tian H K, Geng Y H and Yan D H2006 Appl. Phys. Lett. 88 133508 [4] Di C A, Yu G, Liu Y Q, Xu X J, Song Y B, Wang Y, Sun Y M and Zhu DB 2006 Appl. Phys. Lett. 88 121907 [5] Pan H L, Li Y N, Wu Y L, Liu P, Ong B S, Zhu S P and Xu G 2007 J. Am. Chem. Soc. 129 4112 [6] Yu X H, Yu S Y, Ma D G and Han Y C 2006 Appl. Phys.Lett. 88 263517 [7] Jiang W H, Du G T, Yu S K, Wang W, Chang Y C and Wang X 2006 Chin. Phys. Lett. 23 1939 [8] Gelinck G H, Huitema H E A, Van Veenendaal E, Cantatore E,Schrijnemakers L and van der Putten J et al 2004 Nature Mater. 3 106 [9] Garnier F, Horowitz G, Peng X and Fichou D 1990 Adv.Mater. 2 592 [10] Yoon M-H, Kim C, Facchetti A and Marks T J 2006 Am.Chem. Soc. 128 12851 [11] Jang Y, Kim D H, Park Y D, Cho J H, Hwang M and Cho K 2006 Appl. Phys. Lett. 88 072501 [12] Klauk H, Halik M, Zschieschang U, Eder F, Schmid G and Dehm C 2006 Appl. Phys. Lett. 88 072501 [13] Ficker J, Ullmann A, Fix W, Rost H and W Clemens 2003 J. Appl.Phys. 94 2638 [14] Newman C R, Chesterfield R J, Panzer M J and Frisbie C D 2005 J.Appl. Phys. 98 084506 [15] Cui T and Liang G 2005 Appl. Phys. Lett. 86 064102 [16] Knipp D, Street R A, V\"olkel A and Ho J 2003 J. Appl.Phys. 93 347 [17] Sze S M 1981 Physics of Semiconductor Devices (NewYork: Wiley) [18] Horowitz G, Hajlaoui M E and Hajlaoui R 2000 J. Appl.Phys. 87 4456 [19] Dimitrakopoulos C D, Purushothaman S, Kymissis J, Callegari A andShaw J M 1999 Science 283 822 [20] Yu S, Yi M and Ma D 2006 Semicond. Sci. Technol. 25 1452 [21] Yasuda T, Goto T, Fujita K and Tsutsui T 2004 Appl.Phys. Lett. 85 2098 [22] de Boer R W I, Stassen A F, Craciun M F, Mulder C L, Molinari A,Rogge S and Morpurgo A F 2005 Appl. Phys. Lett. 86 262109 [23] Chua L L, Zaumseil J, Chang J F, Ou E C W, Ho P K H, Sirringhaus Hand Friend R H 2005 Nature 434 194