Retroreflection Characteristics of the Surface Under Diode Laser Radiation
LIU Wenqing, WANG Yaping, JIANG Rongxi, XIA Yuxing
Laser Spectroscopy Laboratory, Anhui Institute of Optics
and Fine Mechanics, Academia Sinica, Hefei 230031
Retroreflection Characteristics of the Surface Under Diode Laser Radiation
LIU Wenqing;WANG Yaping;JIANG Rongxi;XIA Yuxing
Laser Spectroscopy Laboratory, Anhui Institute of Optics
and Fine Mechanics, Academia Sinica, Hefei 230031
关键词 ：
81.70.-q ,
78.55.-m ,
07.60.Hv
Abstract ： The retroreflection characteristics of metal surfaces sprayed with different mixture of Si3 N4 powder and plastic powder were evaluated by an automatic system developed at our laboratory, which normally used to measure the absolute retroreflectance of various surfaces without any reference standard. The preliminary results obtained seem to indicate that the characterization of the retroreflection distribution can be controlled as needed by selecting the sample surface material and/or its mixture. This property may be used in analysis of target signatures.
Key words ：
81.70.-q
78.55.-m
07.60.Hv
出版日期: 1992-07-01
:
81.70.-q
(Methods of materials testing and analysis)
78.55.-m
(Photoluminescence, properties and materials)
07.60.Hv
(Refractometers and reflectometers)
引用本文:
LIU Wenqing;WANG Yaping;JIANG Rongxi;XIA Yuxing. Retroreflection Characteristics of the Surface Under Diode Laser Radiation[J]. 中国物理快报, 1992, 9(7): 386-389.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1992/V9/I7/386
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1992, Vol. 9 
