Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge
ZHAO Jing, KANG Ning, XU Ji-ren
Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge
ZHAO Jing;KANG Ning;XU Ji-ren
Institute of Physics, Chinese Academy of Sciences, Beijing 100080
关键词 ：
81.15.Cd ,
52.75.Rx ,
68.55.-a
Abstract ： Carbon nitride films have been prepared by reactive sputtering using hollow cathode discharge. Auger spectra show that the nitrogen content is about 20-25at.% in the bulk. Infrared (IR) spectra display three broad absorption bands. After heating treatment, changes of IR spectra suggest that the nitrogen incorporating in the bonding network of amorphous is thermally stable and hydrogen content decreases.
Key words ：
81.15.Cd
52.75.Rx
68.55.-a
出版日期: 1996-04-01
引用本文:
ZHAO Jing;KANG Ning;XU Ji-ren. Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge[J]. 中国物理快报, 1996, 13(4): 305-308.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1996/V13/I4/305
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1996, Vol. 13 
