Microstructure Modification of Silicon Nanograins Embedded in Silicon Nitride Thin Films
FU Guang-Sheng1 , DING Wen-Ge1 , SONG Wei-Cai1,2 , ZHANG Jiang-Yong1 , YU Wei1
1 College of Physics Science and Technology, Hebei University, Baoding 071002
2 Department of Physics, Tangshan Teachers’ College, Tangshan 063000
Microstructure Modification of Silicon Nanograins Embedded in Silicon Nitride Thin Films
FU Guang-Sheng1 ; DING Wen-Ge1 ;SONG Wei-Cai1,2 ;ZHANG Jiang-Yong1 ;YU Wei1
1 College of Physics Science and Technology, Hebei University, Baoding 071002
2 Department of Physics, Tangshan Teachers’ College, Tangshan 063000
关键词 ：
78.67.Bf ,
68.55.-a
Abstract ： Microstructure modification of silicon nanograins embedded in silicon nitride films by introducing hydrogen reactant in the plasma enhanced chemical vapour deposition process and their optical properties are analysed using Raman scattering, optical absorption and photoluminescence (PL) measurements. It is found that the silicon nanograins embedded in the silicon nitride (SiNx ) matrix are transformed into silicon nanocrystals and the optical properties of the films change dramatically when introducing H2 into Ar-sustained plasma. The optical absorption coefficient of the films within the band gap decreases by about one order of magnitude and the PL intensity increases significantly, compared with that without hydrogen introduction. These results suggest that atomic hydrogen in the plasma has the function of crystallizing silicon nanograins and passivating defects at the silicon nanograins/SiNx interface.
Key words ：
78.67.Bf
68.55.-a
出版日期: 2006-07-01
:
78.67.Bf
(Nanocrystals, nanoparticles, and nanoclusters)
68.55.-a
(Thin film structure and morphology)
引用本文:
FU Guang-Sheng; DING Wen-Ge;SONG Wei-Cai;ZHANG Jiang-Yong;YU Wei. Microstructure Modification of Silicon Nanograins Embedded in Silicon Nitride Thin Films[J]. 中国物理快报, 2006, 23(7): 1926-1928.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2006/V23/I7/1926
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