Study of Thermal Desorption of Helium from Hydrogenated Zirconium
SUN Wei-Ming, WEI Yu-Cheng, SHI Li-Qun
Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433
Study of Thermal Desorption of Helium from Hydrogenated Zirconium
SUN Wei-Ming;WEI Yu-Cheng;SHI Li-Qun
Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433
关键词 :
52.40.Hf ,
68.55.-a
Abstract : A new method prepared for helium and hydrogen co-containing Zr films is presented to simulate aging metal tritides, in which direct current magnetron sputtering with a He/H/Ar mixture is used. The retained amount and depth profiles of helium and hydrogen are determined by elastic recoil detection analysis. Thermal desorption spectrometry is applied to investigate He thermal release and the effect of hydrogen. It is found that the high-temperature peaks with a large mount of helium release obviously shifted toward lower temperature at high hydrogen concentration, especially at the hydride transformation region, and that the shapes of the release peaks also changed due to the additional hydrogen. However, at the low-temperature releasing region the peak intense decreases when phase transformation takes place. The mechanism of helium thermal release and the effect of hydrogen are also discussed.
Key words :
52.40.Hf
68.55.-a
出版日期: 2006-11-01
:
52.40.Hf
(Plasma-material interactions; boundary layer effects)
68.55.-a
(Thin film structure and morphology)
引用本文:
SUN Wei-Ming;WEI Yu-Cheng;SHI Li-Qun. Study of Thermal Desorption of Helium from Hydrogenated Zirconium[J]. 中国物理快报, 2006, 23(11): 3014-3017.
SUN Wei-Ming, WEI Yu-Cheng, SHI Li-Qun. Study of Thermal Desorption of Helium from Hydrogenated Zirconium. Chin. Phys. Lett., 2006, 23(11): 3014-3017.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2006/V23/I11/3014
[1]
FU Guang-Sheng; DING Wen-Ge;SONG Wei-Cai;ZHANG Jiang-Yong;YU Wei. Microstructure Modification of Silicon Nanograins Embedded in Silicon Nitride Thin Films [J]. 中国物理快报, 2006, 23(7): 1926-1928.
[2]
HE Jia-Qing;E. VASCO;R. DITTMANN;WANG Ren-Hui. Temperature-Dependent Structure of Epitaxial (Ba,Sr)TiO3 Films Grown on SrRuO3 -Covered SrTiO3 Substrates [J]. 中国物理快报, 2006, 23(5): 1269-1272.
[3]
YUE Shuang-Lin;LUO Qiang;SHI Cheng-Ying;YANG Hong-Xin;WANG Qiang;XU Peng;GU Chang-Zhi. NiSi Film Synthesized by Isochronal Annealing in a Magnetron Sputtering System [J]. 中国物理快报, 2006, 23(3): 678-681.
[4]
LV Guo-Hua;GU Wei-Chao;CHEN Huan;LI Li;NIU Er-Wu;YANG Si-Ze. Microstructure and Corrosion Performance of Oxide Coatings on Aluminium by Plasma Electrolytic Oxidation in Silicate and Phosphate Electrolyte [J]. 中国物理快报, 2006, 23(12): 3331-3333.
[5]
LI Li;NIU Er-Wu;LV Guo-Hua;FENG Wen-Ran;GU Wei-Chao;CHEN Guang-Liang;ZHANG Gu-Ling;FAN Song-Hua;LIU Chi-Zi;YANG Si-Ze. Preparation and Microstructure of Tantalum Nitride Thin Film by Cathodic Arc Deposition [J]. 中国物理快报, 2006, 23(11): 3018-3021.
[6]
A. V. Svalov;V. O. Vas’kovskiy;G. V. Kurlyandskaya;J. M. Barandiaran;I. Orue;N. N. Schegoleva;A. N. Sorokin. Structural Peculiarities and Magnetic Properties of Nanoscale Terbium in Tb/Ti and Tb/Si Multilayers [J]. 中国物理快报, 2006, 23(1): 196-199.
[7]
SI Jian-Xiao;WU Hui-Zhen;XU Tian-Ning;CAO Chun-Fang;HUANG Zhan-Chao. Microstructural Properties of Single Crystalline PbTe Thin Films Grown on BaF2 (111) by Molecular Beam Epitaxy [J]. 中国物理快报, 2005, 22(9): 2353-2356.
[8]
WANG Hong-Chang;WANG Zhan-Shan;ZHANG Shu-Min;WU Wen-Juan;ZHANG Zhong;GU Zhong-Xiang;XU Yao;WANG Feng-Li;CHENG Xin-Bin;WANG Bei;QIN Shu-Ji;CHEN Ling-Yan. Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering [J]. 中国物理快报, 2005, 22(8): 2106-2108.
[9]
JIANG Ke;HOU Lu-Jing;WANG You-Nian. Interactions of a Projectile Charge with Two-Dimensional Dusty Plasmas [J]. 中国物理快报, 2005, 22(7): 1713-1716.
[10]
XU Shi-Lin; SHI Li-Qun. Phase Structural Characteristics of ZrV2 Thin Film Prepared by Magnetron Sputtering [J]. 中国物理快报, 2005, 22(5): 1202-1204.
[11]
GAO Mei-Zhen;SHI Hui-Gang;Job R.;LI Fa-Shen;Fahrner W. R.. Substrate Dependence of Properties of Sputtered ITO Films [J]. 中国物理快报, 2005, 22(5): 1228-1231.
[12]
FEI Yi-Yan;WANG Xu;LU Hui-Bin;YANG Guo-Zhen;ZHU Xiang-Dong;. Unit-Cell by Unit-Cell Homoepitaxial Growth Using Atomically Flat SrTiO3 (001) Substrates and Pulsed Laser Deposition [J]. 中国物理快报, 2005, 22(4): 1002-1005.
[13]
WANG Wen-Hao;HE Ye-Xi;GAO Zhe;ZENG Li;ZHANG Guo-Ping;XIE Li-Feng;FENG Chun-Hua;XIAO Qiong;LI Xiao-Yan. Edge Electrostatic Fluctuation Characteristics in the Sino-United Spherical Tokamak [J]. 中国物理快报, 2004, 21(8): 1578-1581.
[14]
YU Wei;WANG Bao-Zhu;LU Wan-Bing;YANG Yan-Bin;HAN Li;FU Guang-Sheng. Growth of Nanocrystalline Silicon Films by Helicon Wave Plasma Chemical Vapour Deposition [J]. 中国物理快报, 2004, 21(7): 1320-1322.
[15]
YANG Ying-Ge;MA Hong-Lei;MA Jin;ZHANG Ya-Fei. Preparation and Properties of GaN Films on GaAs Substrates
[J]. 中国物理快报, 2004, 21(5): 955-957.