PHOTOLUMINESCENCE SPECTRA OF STRAINED HETEROSTRUCTURE OF InP ON GaAs SUBSTRATE GROWN BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION
TENG Da, ZHUANG Weihua
Laboratory of Superlattice and Microstructure,
Institute of Semiconductors, Academia Sinica, Beijing 100083
PHOTOLUMINESCENCE SPECTRA OF STRAINED HETEROSTRUCTURE OF InP ON GaAs SUBSTRATE GROWN BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION
TENG Da;ZHUANG Weihua
Laboratory of Superlattice and Microstructure,
Institute of Semiconductors, Academia Sinica, Beijing 100083
关键词 :
73.40.Lq ,
46.30.Jv ,
65.70.+y ,
78.55.Cr
Abstract : A high-energy shift of the band-band recombination has been observed in photoluminescence spectra of the strained InP layer grown on GaAs substrate. The InP layer is under biaxial compressive strain at temperatures below the growth temperature, because the thermal expansion coefficient of InP is smaller than that of GaAs. The strain value determined by the energy shift of the band-edge peak is in good agreement with the calculated thermal strain. A band to carbon acceptor recombination is also identified.
Key words :
73.40.Lq
46.30.Jv
65.70.+y
78.55.Cr
出版日期: 1990-11-01
引用本文:
TENG Da;ZHUANG Weihua. PHOTOLUMINESCENCE SPECTRA OF STRAINED HETEROSTRUCTURE OF InP ON GaAs SUBSTRATE GROWN BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION[J]. 中国物理快报, 1990, 7(11): 522-525.
TENG Da, ZHUANG Weihua. PHOTOLUMINESCENCE SPECTRA OF STRAINED HETEROSTRUCTURE OF InP ON GaAs SUBSTRATE GROWN BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION. Chin. Phys. Lett., 1990, 7(11): 522-525.
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https://cpl.iphy.ac.cn/CN/Y1990/V7/I11/522
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