Fabricating Master with Reactive Ion Beam Etching Method
ZOU Zhi-qiang, FANG Hong-li, FU Xin-ding, CHEN Guo-ming
Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai 200050
Fabricating Master with Reactive Ion Beam Etching Method
ZOU Zhi-qiang;FANG Hong-li;FU Xin-ding;CHEN Guo-ming
Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai 200050
关键词 ：
41.79.Yd ,
61.80.Jh
Abstract ： The fabrication process of glass master or glass etching optical disk using reactive ion beam (RIB) etching method was studied. Photoresist was applied for image reversal. RIB etching using CF4 gas transferred the pregrooves into the glass substrate. The shape and depth of the pregrooves in the glass is a function of the RIB etcher settings. A glass substrate of Ф130mm with etched pregrooves (track pitch was 1.6 μm and groove depth 0.1 μm ) was obtained, showing that a glass master or glass etching disc can be fabricated by this technique.
Key words ：
41.79.Yd
61.80.Jh
出版日期: 1998-07-01
引用本文:
ZOU Zhi-qiang;FANG Hong-li;FU Xin-ding;CHEN Guo-ming. Fabricating Master with Reactive Ion Beam Etching Method[J]. 中国物理快报, 1998, 15(7): 495-497.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1998/V15/I7/495
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