Enhancement of Atomic Rearrangement in Top Surface Layers by Low Energy Ions
MA Zhong-quan1, LIU Bai-xin2
1Functional Materials Laboratory, Department of Physics, Xinjiang University, Urumqi 830046
2Department of Materials Science and Engineering, Tsinghua University, Beijing 100084
Enhancement of Atomic Rearrangement in Top Surface Layers by Low Energy Ions
MA Zhong-quan1;LIU Bai-xin2
1Functional Materials Laboratory, Department of Physics, Xinjiang University, Urumqi 830046
2Department of Materials Science and Engineering, Tsinghua University, Beijing 100084
Abstract： Assuming rectilinear trajectories for the projectile into a solid surface, a specific expression for the “energy window” of the driving atoms in a monolayer has been derived for different ion-target systems, in which the atomic displacements occur primarily in the surface layer, while the subsurface layer is kept intact. The results obtained here are in good agreement with Brice et al.’s numerical estimations and close to experimental data for ion beam assisted depositions.
(Ion and electron beam-assisted deposition; ion plating)
引用本文:
MA Zhong-quan;LIU Bai-xin. Enhancement of Atomic Rearrangement in Top Surface Layers by Low Energy Ions[J]. 中国物理快报, 1998, 15(9): 668-670.
MA Zhong-quan, LIU Bai-xin. Enhancement of Atomic Rearrangement in Top Surface Layers by Low Energy Ions. Chin. Phys. Lett., 1998, 15(9): 668-670.
1998, Vol. 15 
