Chin. Phys. Lett.  2015, Vol. 32 Issue (09): 098501    DOI: 10.1088/0256-307X/32/9/098501
CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Solution-Processed High Mobility Top-Gate N-Channel Polymer Field-Effect Transistors
XIANG Lan-Yi, YING Jun, HAN Jin-Hua, WANG Wei**, XIE Wen-Fa
State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012
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XIANG Lan-Yi, YING Jun, HAN Jin-Hua et al  2015 Chin. Phys. Lett. 32 098501
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Abstract Polymer field-effect transistors operated in the n-channel model with a top-gate/bottom-contact are processed using a solution method. The transistor performance depends on the gate dielectric layer. A high performance polymer transistor is achieved, with the saturated electron mobility of about 0.46 cm2/Vs, threshold voltage nearly 0 V and subthreshold sway of about 0.9 V/decade, employing a polystyrene (PS) dielectric layer. The transistor performances are further improved with increasing current and lower operation voltages by utilizing a bi-layer gate dielectric, comprising a thin PS dielectric layer adjacent to the semiconductor to minimize the density of the interface traps for obtaining a small VT, a large μ and a poly(methyl methacrylate) (PMMA) dielectric layer with a relatively high-κ adjacent to the gate electrode for enlarging the capacitance, processed from the orthogonal solvents.
Received: 07 April 2015      Published: 02 October 2015
PACS:  85.30.Tv (Field effect devices)  
  72.80.Le (Polymers; organic compounds (including organic semiconductors))  
  73.40.Qv (Metal-insulator-semiconductor structures (including semiconductor-to-insulator))  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/32/9/098501       OR      https://cpl.iphy.ac.cn/Y2015/V32/I09/098501
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XIANG Lan-Yi
YING Jun
HAN Jin-Hua
WANG Wei
XIE Wen-Fa
[1] Mizukami M, Hirohata N, Iseki T, Ohtawara K, Tada T, Yagyu S, Abe T, Suzuki T, Fujisaki Y, Inoue Y, Tokito S and Kurita T 2006 IEEE Electron Device Lett. 27 249
[2] Baude P F, Ender D A, Haase M A, Kelley T W, Muyres D V and Theiss S D 2003 Appl. Phys. Lett. 82 3964
[3] Klauk H, Zschieschang U, Pflaum J and Halik M 2007 Nature 445 745
[4] Wang W and Ma D G 2010 Chin. Phys. Lett. 27 018503
[5] Knopfmacher O, Hammock M L, Appleton A L, Schwartz G, Mei J, Lei T, Pei J and Bao Z 2014 Nat. Commun. 5 2954
[6] Chen H J, Guo Y L, Yu G, Zhao Y, Zhang J, Gao D, Liu H T and Liu Y Q 2012 Adv. Mater. 24 4618
[7] Schmidt R, Oh J H, Sun Y S, Deppisch M, Krause A M, Radacki K, Braunschweig H, K?nemann M, Erk P, Bao Z and Würthner F 2009 J. Am. Chem. Soc. 131 6215
[8] Kim H, Sohn S, Jung D, Maeng W J, Kim H, Kim T S, Hahn J, Lee S, Yi Y and Cho M H 2008 Org. Electron. 9 1140
[9] Kang J, Shin N, Jang D Y, Prabhu V M and Yoon Do Y 2008 J. Am. Chem. Soc. 130 12273
[10] Jedaa A, Burkhardt M, Zschieschang U, Klauk H, Habich D, Schmid G and Halik M 2009 Org. Electron. 10 1442
[11] Zhang H, Mi B X, Li X, Gao Z Q, Zhao Lu and Huang W 2013 Chin. Phys. Lett. 30 028501
[12] Wang Z, Alam M W, Lou Yi, Naka S and Okada H 2012 Appl. Phys. Lett. 100 043302
[13] Faraji S, Hashimoto T, Turner M L and Majewski L A 2015 Org. Electron. 17 178
[14] Singh R, Meena J S, Tsai I H, Lin Y T and Wang C J, Ko F H2015 Org. Electron. 19 120
[15] Noh Y Y, Zhao N, Caironi M and Sirringhaus H 2007 Nat. Nanotechnol. 2 784
[16] Richards T J and Sirringhaus H 2007 J. Appl. Phys. 102 094510
[17] Yan H, Chen Z H, Zheng Y, Newman C, Quinn J R, Dotz F and Kastler M 2009 Nature 457 679
[18] Caironi M, Bird M, Fazzi D, Chen Z, Pietro R D, Newman C, Facchetti A and Sirringhaus H 2011 Adv. Funct. Mater. 21 3371
[19] Baeg K J, Khim D, Jung S W, Kang M, You I K, Kim D Y, Facchetti A and Noh Y Y 2012 Adv. Mater. 24 5433
[20] Unni K N N, Sylvie D S and Nunzi J M 2005 J. Phys. D: Appl. Phys. 38 1148
[21] Veres J, Ogier S D, Leeming S W, Cupertino D C and Khaffaf S M 2003 Adv. Funct. Mater. 13 199
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