Abstract：Hydrogen is produced by direct dissociation of water vapor, i.e., splitting water molecules by the electrons in water plasma at low pressure (<10–50 Torr) using microwave plasma discharge. This condition generates a high electron temperature, which facilitates the direct dissociation of water molecules. A microwave plasma source is developed, utilizing the magnetron of a microwave oven and a TE10 rectangular waveguide. The quantity of the generated hydrogen is measured using a residual gas analyzer. The electron density and temperature are measured by a Langmuir probe, and the neutral temperature is calculated from the OH line intensity.
. [J]. 中国物理快报, 2013, 30(6): 65204-065204.
Yong Ho Jung, Soo Ouk Jang, Hyun Jong You. Hydrogen Generation from the Dissociation of Water Using Microwave Plasmas. Chin. Phys. Lett., 2013, 30(6): 65204-065204.
[1] Yurum Y 1994 Proceedings of the NATO Advanced Study Institute on Hydrogen Energy System, Utilization of Hydrogen and Future Aspects (Turkey) [2] Springmann S, Friedrich G, Himmen M, Sommer M and Eigenberger G 2002 Appl. Catal. A 235 101 [3] Deluga G A, Salge J R, Schmidt L D and Verykios X E 2004 Science303 993 [4] D O E 2004 The Hydrogen Economy: Opportunities, Costs, Barriers and RD Needs (Washington DC: National Academy Press) [5] Nakajima H, Sakurai M, Ikenoya K, Hwang G J, Onuki K and Simizu S 1999 The 7th International Conference on Nuclear Engineering (Japan) [6] Roth J R 1995 Industrial Plasma Engineering (Bristol and Philadelphia: Institute of Physics Publishing) [7] Langmuir I and Mott-Smith H M 1923 Gen. Electr. Rev.26 731 [8] Mutaf-Yardimci O, Saveliev A V, Fridman A A and Kennedy L A 1998 Int. J. Hydrogen Energy23 1109 [9] Deminsky M, Jivotov V, Potapkin B and Rusanov V 2002 Pure Appl. Chem.74 423 [10] Thanyachotpaiboon K, Chavadej S, Caldwell T A, Lobban L L and Mallinson R G 1998 AICHE J.44 2252 [11] Boudesocque N, Vandensteendam C, Lafon C, Girold C and Baronnet J M 2006 The 16th World Hydrogen Energy Conference (France) [12] Kabashima H, Einaga H and Futamura S 2001 Chem. Lett.30 1314 [13] Kirkpatrick M J and Locke B R 2005 Indust. Eng. Chem. Res.44 4243 [14] Koo I G, Choi M Y, Kim J H, Cho J H and Lee W M 2008 Jpn. J. Appl. Phys.47 4705 [15] Sekiguchi H and Mori Y 2003 Thin Solid Films435 44 [16] Chen X, Suib S L, Hayashi Y and Matsumoto H 2001 J. Catal.201 198 [17] Hueso J L, Rico V J, Cotrino J, Mateos J M J and Elipe A R G 2009 Environ. Sci. Technol.43 2557 [18] Itikawa Y and Mason N 2005 J. Phys. Chem. Ref. Data34 1 [19] Lin T L 2001 Proc. 2001 International Workshop on Plasma Processing for Nuclear Applications (Korea) [20] Jung Y H and Chung K S 2002 J. Korean Phys. Soc.40 856 [21] Moisan M and Pelletier F 1992 Microwave Excited Plasmas (London: Elsevier) [22] Chen F F 1965 Electric Probes in Plasma Diagnostic Techniques (New York: Academic Press) [23] Izarra C 2000 J. Phys. D: Appl. Phys.33 1697 [24] Pellerin S, Cormiery J M, Richardy F, Musiolz K and Chapelle J 1996 J. Phys. D: Appl. Phys.29 726 [25] Diecke G H and Crosswhite H M 1962 J. Quant. Spectrosc. Radiat. Transfer2 97 [26] Craig J S, Salit M L and Reader J 1996 Appl. Opt.35 74 [27] Raud J, Laan M and Jogi I 2011 J. Phys. D: Appl. Phys.44 345201 [28] Bruggemann P, Schram D C, Kong M G and Leys C 2009 Plasma Process Polym.6 751 [29] Verreycken T, Schram D C, Leys C and Bruggemann P 2010 Plasma Sources Sci. Technol.19 045004
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