A Microfabricated Inductively Coupled Plasma Excitation Source
WANG Yong-Qing1,2, PU Yong-Ni1, SUN Rong-Xia1, TANG Yu-Jun1, CHEN Wen-Jun1, LOU Jian-Zhong1, MA Wen3
1College of Electronic and Informational Engineering, Hebei University, Baoding 0710022Central Iron and Steel Research Institute, National Testing Center of Iron and Steel, Beijing 1000813Chinese People's Armed Police Forces Academy, Langfang 065000
A Microfabricated Inductively Coupled Plasma Excitation Source
WANG Yong-Qing1,2;PU Yong-Ni1;SUN Rong-Xia1;TANG Yu-Jun1;CHEN Wen-Jun1;LOU Jian-Zhong1;MA Wen3
1College of Electronic and Informational Engineering, Hebei University, Baoding 0710022Central Iron and Steel Research Institute, National Testing Center of Iron and Steel, Beijing 1000813Chinese People's Armed Police Forces Academy, Langfang 065000
摘要A novel miniaturization of inductively coupled plasma (ICP) source based on printed circuit produced using micro-fabrication techniques is presented. The basic parameters of the novel ICP, including its radio frequency, power loss, size, and argon consumption are less than 1% of that for the case of atmospheric pressure ICP source. For example, at 100Pa of argon gas pressure, the present ICP source can be ignited by using the rf power less than 3.5W. Potential applications of the ICP is discussed.
Abstract：A novel miniaturization of inductively coupled plasma (ICP) source based on printed circuit produced using micro-fabrication techniques is presented. The basic parameters of the novel ICP, including its radio frequency, power loss, size, and argon consumption are less than 1% of that for the case of atmospheric pressure ICP source. For example, at 100Pa of argon gas pressure, the present ICP source can be ignited by using the rf power less than 3.5W. Potential applications of the ICP is discussed.
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2008, Vol. 25 
