Comparative Study on Excitation Temperature, Electron Temperature and Electron Density in an Atmospheric Argon Microwave Plasma
WANG Zhong** , ZHANG Gui-Xin, LIU Cheng, JIA Zhi-Dong
Department of Electrical Engineering, Tsinghua University, Beijing 100084
Abstract ：An infinite-volume of atmospheric argon microwave plasma is produced in the microwave plasma source based on the inductive coupling window-rectangular resonator under the input of the microwave power at 2.45 GHz. The excitation temperature of the plasma is studied by using the Boltzmann plot of Ar I lines in two different wavelength ranges while the electron temperature is researched by using line-to-continuum intensity ratio of Ar I lines. The electron density is compared by using the Stark broadenings of Ar I lines at 522.13 nm and 549.59 nm and Hβ
出版日期: 2014-04-24
:
52.80.Pi
(High-frequency and RF discharges)
52.50.Dg
(Plasma sources)
52.70.Kz
(Optical (ultraviolet, visible, infrared) measurements)
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2014, Vol. 31 
