摘要The Kirk test has good precision for measuring stray light in optical lithography and is the usual method of measuring stray light. However, Kirk did not provide a theoretical explanation to his simulation model. We attempt to give Kirk's model a kind of theoretical explanation and a little improvement based on the model of point spread function of scattering and the theory of statistical optics. It is indicated by simulation that the improved model fits Kirk's measurement data better.
Abstract：The Kirk test has good precision for measuring stray light in optical lithography and is the usual method of measuring stray light. However, Kirk did not provide a theoretical explanation to his simulation model. We attempt to give Kirk's model a kind of theoretical explanation and a little improvement based on the model of point spread function of scattering and the theory of statistical optics. It is indicated by simulation that the improved model fits Kirk's measurement data better.
CHEN De-Liang;CAO Yi-Ping**;HUANG Zhen-Fen
. Theoretical Explanation and Improvement to the Flare Model of Lithography Based on the Kirk Test[J]. 中国物理快报, 2011, 28(6): 68503-068503.
CHEN De-Liang, CAO Yi-Ping**, HUANG Zhen-Fen
. Theoretical Explanation and Improvement to the Flare Model of Lithography Based on the Kirk Test. Chin. Phys. Lett., 2011, 28(6): 68503-068503.
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