2011, Vol. 28(6): 68503-068503    DOI: 10.1088/0256-307X/28/6/068503
	Theoretical Explanation and Improvement to the Flare Model of Lithography Based on the Kirk Test
	CHEN De-Liang, CAO Yi-Ping**, HUANG Zhen-Fen
	Department of Opto-Electronics, Sichuan University, Chengdu 610065
	收稿日期 2010-12-24  修回日期 1900-01-01
	Supporting info
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