Structural and Luminescent Properties of ZnO Thin Films Deposited by Atmospheric Pressure Chemical Vapour Deposition
ZHAO Guo-Liang2, LIN Bi-Xia1,2, HONG Liang2, MENG Xiang-Dong2, FU Zhu-Xi1,2
1Structure Research Laboratory, University of Science and Technology of China, Hefei 230026
2Department of Physics, University of Science and Technology of China, Hefei 230026
Structural and Luminescent Properties of ZnO Thin Films Deposited by Atmospheric Pressure Chemical Vapour Deposition
1Structure Research Laboratory, University of Science and Technology of China, Hefei 230026
2Department of Physics, University of Science and Technology of China, Hefei 230026
Abstract： ZnO thin films were successfully deposited on Si (100) substrates by chemical vapour deposition (CVD) at atmospheric pressure (1 atm). The only solid source used here is zinc acetate, (CH3COO)2Zn, and the carrier gas is nitrogen. The sample, which was prepared at 550°C during growth and then annealed in air at 900°C, has only a ZnO (002) diffraction peak at 34.6° with its FWHM of 0.23° in the XRD pattern. The room-temperature PL spectrum shows a strong ultraviolet emission with the peak centred at 380 nm. We analysed the effects of many factors, such as the source, substrates, growth and annealing temperatures, and annealing ambience, on the structural and optical properties of our prepared ZnO films.
ZHAO Guo-Liang;LIN Bi-Xia;HONG Liang;MENG Xiang-Dong;FU Zhu-Xi;. Structural and Luminescent Properties of ZnO Thin Films Deposited by Atmospheric Pressure Chemical Vapour Deposition[J]. 中国物理快报, 2004, 21(7): 1381-1383.
ZHAO Guo-Liang, LIN Bi-Xia, HONG Liang, MENG Xiang-Dong, FU Zhu-Xi,. Structural and Luminescent Properties of ZnO Thin Films Deposited by Atmospheric Pressure Chemical Vapour Deposition. Chin. Phys. Lett., 2004, 21(7): 1381-1383.
2004, Vol. 21 
