中国物理快报  2021, Vol. 38 Issue (2): 28101-    DOI: 10.1088/0256-307X/38/2/028101
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Towards Fabrication of Atomic Dopant Wires via Monolayer Doping Patterned by Resist-Free Lithography
Chufan Zhang1†, Ke Li1†, Xiaoxian Zang2, Fuyuan Ma2, and Yaping Dan1*
1University of Michigan–Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
2Key Laboratory of Solar Energy Utilization & Energy Saving Technology of Zhejiang Province, Zhejiang Energy R&D Institute Co., Ltd., Hangzhou 311121, China