Ferromagnetic MnSn Monolayer Epitaxially Grown on Silicon Substrate
Qian-Qian Yuan1, Zhaopeng Guo1, Zhi-Qiang Shi1, Hui Zhao1, Zhen-Yu Jia1, Qianjin Wang1, Jian Sun1,2, Di Wu1,2, and Shao-Chun Li1,2,3*
1National Laboratory of Solid State Microstructures, School of Physics, Nanjing University, Nanjing 210093, China 2Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China 3Jiangsu Provincial Key Laboratory for Nanotechnology, Nanjing University, Nanjing 210093, China
Abstract：Two-dimensional (2D) ferromagnetic materials have been exhibiting promising potential in applications, such as spintronics devices. To grow epitaxial magnetic films on silicon substrate, in the single-layer limit, is practically important but challenging. In this study, we realized the epitaxial growth of MnSn monolayer on Si(111) substrate, with an atomically thin Sn/Si(111)-$2\sqrt 3 \times 2\sqrt 3$-buffer layer, and controlled the MnSn thickness with atomic-layer precision. We discovered the ferromagnetism in MnSn monolayer with the Curie temperature ($T_{\rm c}$) of ${\sim} 54$ K. As the MnSn film is grown to 4 monolayers, $T_{\rm c}$ increases accordingly to ${\sim} 235$ K. The lattice of the epitaxial MnSn monolayer as well as the Sn/Si(111)-$2\sqrt 3 \times 2\sqrt 3$ is perfectly compatible with silicon, and thus an sharp interface is formed between MnSn, Sn and Si. This system provides a new platform for exploring the 2D ferromagnetism, integrating magnetic monolayers into silicon-based technology, and engineering the spintronics heterostructures.
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2020, Vol. 37 
