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Effect of Phantom Dark Energy on Holographic Thermalization |
| Xiao-Xiong Zeng1,2, Xin-Yun Hu3**, Li-Fang Li4 |
1School of Material Science and Engineering, Chongqing Jiaotong University, Chongqing 400074
2Institute of Theoretical Physics, Chinese Academy of Sciences, Beijing 100190
3School of Economics and Management, Chongqing Jiaotong University, Chongqing 400074
4State Key Laboratory of Space Weather, Center for Space Science and Applied Research, Chinese Academy of Sciences, Beijing 100190
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| Cite this article: |
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Xiao-Xiong Zeng, Xin-Yun Hu, Li-Fang Li 2017 Chin. Phys. Lett. 34 010401 |
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Abstract Holographic thermalization for a black hole surrounded by phantom dark energy is probed. The result shows that the smaller the phantom dark energy parameter is, the easier the is plasma to thermalize as the chemical potential is fixed, the larger the chemical potential is, and the harder the plasma is to thermalize as the dark energy parameter is fixed. The thermalization velocity and thermalization acceleration are presented by fitting the thermalization curves.
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Received: 20 October 2016
Published: 29 December 2016
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| PACS: |
04.70.-s
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(Physics of black holes)
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04.70.Dy
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(Quantum aspects of black holes, evaporation, thermodynamics)
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04.25.dc
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(Numerical studies of critical behavior, singularities, and cosmic censorship)
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| Fund: Supported by the National Natural Science Foundation of China under Grant Nos 11405016 and 11365008, and the China Postdoctoral Science Foundation under Grant No 2016M590138. |
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