| FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Surface Plasmon Interference Lithography Assisted by a Fabry–Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film |
| LIANG Hui-Min, WANG Jing-Quan**, WANG Xue, WANG Gui-Mei |
Hebei University of Engineering, Handan 056038
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| Cite this article: |
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LIANG Hui-Min, WANG Jing-Quan, WANG Xue et al 2015 Chin. Phys. Lett. 32 104206 |
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Abstract A surface plasmon interference lithography assisted by a Fabry–Perot (F-P) cavity composed of subwavelength metal gratings and a thin metal film is proposed to fabricate high-quality nanopatterns. The calculated results indicate that uniform straight interference fringes with high contrast and high electric-field intensity are formed in the resist under the F-P cavity. The analyses of spatial frequency spectra illuminate the physical mechanism of the formation for the interference fringes. The influence of the F-P cavity spacing is discussed in detail. Moreover, the error analyses reveal that all parameters except the metal grating period in this scheme can bear large tolerances for the device fabrication.
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Received: 30 March 2015
Published: 30 October 2015
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| PACS: |
42.82.Cr
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(Fabrication techniques; lithography, pattern transfer)
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42.79.-e
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(Optical elements, devices, and systems)
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52.35.Hr
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(Electromagnetic waves (e.g., electron-cyclotron, Whistler, Bernstein, upper hybrid, lower hybrid))
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