FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Electron Beam Lithographic Pixelated Micropolarizer Array for Real-Time Phase Measurement |
ZHANG Zhi-Gang1, DONG Feng-Liang2, CHENG Teng1, QIAN Ke-Mao3, QIU Kang1, ZHANG Qing-Chuan1**, CHU Wei-Guo2**, WU Xiao-Ping1 |
1CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Modern Mechanics, University of Science and Technology of China, Hefei 230027 2Nanofabrication Laboratory, National Center for Nanoscience and Technology, Beijing 100190 3School of Computer Engineering, Nanyang Technological University, Singapore 639798, Singapore
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Cite this article: |
ZHANG Zhi-Gang, DONG Feng-Liang, CHENG Teng et al 2014 Chin. Phys. Lett. 31 114208 |
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Abstract Pixelated micropolarizer arrays (PMAs) have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320×240 aluminum PMA with 7.4 μm pitch is successfully fabricated by the proposed technique. The period of the grating is 140 nm, and the polarization directions of each of the 2×2 units are 0°, 45°, 90°, and 135°. The scanning electron microscopy and optical microscopy results show that the PMA has a good surface characteristic and polarization performances. When the PMA is applied to phase-shifting interferometry, four fringe patterns of different polarization directions are obtained from only one single frame image, and then the object wave phase is calculated in real time.
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Published: 28 November 2014
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