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Magnetoresistance Probe of Ultrathin Mn5Ge3 Films with Anderson Weak Localization |
CHEN Li-Jun, WANG De-Yong, ZHAN Qing-Feng, HE Wei, LI Qing-An |
State Key Laboratory of Magnetism and Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190 |
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Cite this article: |
CHEN Li-Jun, WANG De-Yong, ZHAN Qing-Feng et al 2008 Chin. Phys. Lett. 25 2625-2627 |
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Abstract We present the magnetoresistance measurements of ultrathin Mn5Ge3}$ films with different thicknesses at low Temperatures. Owing to the lattice mismatch between Mn5Ge3 and Ge (111), the thickness of Mn5Ge3 films has a significant effect on the magnetoresistance. When the thickness of Mn is more than 72 monolayers (MLs), the magnetoresistance of the Mn5Ge3 films appears a peak at about 6kOe, which shows that the magnetoresistance results from the Anderson weak localization effect and the variable range hopping in the presence of a magnetic field. The magnetic and semiconducting properties indicate that the Mn5Ge3 film is a potential material for spin injection.
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Keywords:
73.20.Fz
73.43.Qt
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Received: 18 March 2008
Published: 26 June 2008
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