Chin. Phys. Lett.  2008, Vol. 25 Issue (10): 3643-3645    DOI:
Original Articles |
Sputtering Induced by Arq+ Impact on Nb Surface
WANG Tie-Shan1, CHEN Liang1, PENG Hai-Bo1, CHENG Rui1, XIANG Yang1, WANG Yu-Yu2, XIAO Guo-Qing2
1School of Nuclear Science and Technology, Lanzhou University, Lanzhou 7300002Institute of Modern Physics, Chinese Academy of Science, Lanzhou 730000
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WANG Tie-Shan, CHEN Liang, PENG Hai-Bo et al  2008 Chin. Phys. Lett. 25 3643-3645
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Abstract The relative sputtering yield induced by highly charged Arq+ impacting on Nb surface is investigated. The yield increases drastically as the incidence angle increases. A formula Y=A*tanB(θ)+C, developed from classical sputtering theory, fits well with the yield. By analysing a series of coefficients A and C extracted by curve fitting, the results demonstrate the presence of a synergy of the linear cascade collision and potential energy deposition.
Keywords: 34.50.Dy      34.50.Bw     
Received: 05 December 2007      Published: 26 September 2008
PACS:  34.50.Dy  
  34.50.Bw (Energy loss and stopping power)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2008/V25/I10/03643
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WANG Tie-Shan
CHEN Liang
PENG Hai-Bo
CHENG Rui
XIANG Yang
WANG Yu-Yu
XIAO Guo-Qing
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