Chin. Phys. Lett.  2005, Vol. 22 Issue (8): 2031-2034    DOI:
Original Articles |
Effect of Ag Doping on Optical and Electrical Properties of ZnO Thin Films
XU Jin;ZHANG Zi-Yu;ZHANG Yang;LIN Bi-Xia;FU Zhu-Xi
Department of Physics, University of Science and Technology of China, Hefei 230026
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XU Jin, ZHANG Zi-Yu, ZHANG Yang et al  2005 Chin. Phys. Lett. 22 2031-2034
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Abstract ZnO thin films were prepared on p-type Si (100) substrates by the sol-gel process. The influence of Ag doping at a content of 0.002 % on the photoluminescence and current-voltage (I-V) characteristics of ZnO thin films has been investigated. It is found that Ag doping leads to a pronounced increase in the intensity of near band edge emission at 3.23eV and a remarkable red shift of the visible broadband at room temperature. The I-V characteristics of ZnO/p-Si heterojunctions are also changed. These results could be explained by Ag substituting for Zn in Ag doped ZnO thin films.
Keywords: 73.20.Hb      78.55.Et      73.61.Ga     
Published: 01 August 2005
PACS:  73.20.Hb (Impurity and defect levels; energy states of adsorbed species)  
  78.55.Et (II-VI semiconductors)  
  73.61.Ga (II-VI semiconductors)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2005/V22/I8/02031
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