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Shadow Effect and Its Revisal in Grid-Enhanced Plasma Source with Ion Implantation Method |
| ZHANG Gu-Ling1;WANG Jiu-Li1;LIU Yuan-Fu1;LI Xue-Ming2;WU Xing-Fang2;FAN Song-Hua1;LIU Chi-Zi1;YANG Si-Ze1 |
| 1Institute of Physics, Chinese Academy of Sciences, Beijing 100080
2School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083 |
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| Cite this article: |
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ZHANG Gu-Ling, WANG Jiu-Li, LIU Yuan-Fu et al 2004 Chin. Phys. Lett. 21 1114-1116 |
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Abstract The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surface grid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, we need to use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, we apply an axial magnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that the shadow effect of sample surfaces can be weakened.
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| Keywords:
52.75.Dq
68.55.Jk
62.20.Qp
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Published: 01 June 2004
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