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Direct Measurement of Evanescent Wave Interference with a Scanning Near-field Optical Microscope |
| HONG Tao;WANG Jia;XU Tie-Jun;SUN Li-Qun |
| State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084
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| Cite this article: |
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HONG Tao, WANG Jia, XU Tie-Jun et al 2004 Chin. Phys. Lett. 21 907-910 |
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Abstract Evanescent wave interference is studied theoretically and experimentally. The interference patterns were directly measured with a scanning near-field optical microscope. The acquired image of the interference pattern is clear and has better contrast than that previously acquired with a photon-scanning tunnelling microscope or laser-trapped particles. The spatial period of the interference fringes is 180 nm, which agrees with the theoretical value. The results indicate that the probe of the scanning near-field optical microscope has a resolution beyond 100 nm. The relation between the evanescent field intensity and the distance is also measured. When the separation between the probe and the interface is up to 180 nm, the intensity can decrease to 1/e of the maximum.
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| Keywords:
68.37.Uv
07.79.Fc
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Published: 01 May 2004
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| PACS: |
68.37.Uv
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(Near-field scanning microscopy and spectroscopy)
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07.79.Fc
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(Near-field scanning optical microscopes)
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