Preparation of Nano-Graphite Films and Field Emission Properties

Chin. Phys. Lett.

2004, Vol. 21

Issue (5): 904-906 DOI:

Original Articles

Preparation of Nano-Graphite Films and Field Emission Properties

ZHAO Yong-Mei;ZHANG Bing-Lin;YAO Ning;LU Zhan-Ling;ZHANG Xin-Yue

Laboratory of Materials Physics (Ministry of Education) and Department of Physics, Zhengzhou University, Zhengzhou 450052

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ZHAO Yong-Mei, ZHANG Bing-Lin, YAO Ning et al 2004 Chin. Phys. Lett. 21 904-906

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Abstract Nano-graphite films have been deposited on n-Si substrates by microwave plasma chemical vapour deposition. The surface morphology and microstructure of the films were tested by scanning electron microscopy, x-ray diffraction and Raman spectroscopy. In the field emission measurement, a turn-on field of 0.5 V/μm and a high emission-site density of 10⁵/cm² on a tested emission area of (34 x 35 mm²) have been obtained.

Keywords: 61.46.+w 79.70.+q 81.15.Gh

Published: 01 May 2004

PACS:	61.46.+w
	79.70.+q	(Field emission, ionization, evaporation, and desorption)
	81.15.Gh	(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y2004/V21/I5/0904

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	ZHAO Yong-Mei
	ZHANG Bing-Lin
	YAO Ning
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	ZHANG Xin-Yue

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