Original Articles |
|
|
|
|
Structural and Optical Characterization of Zn1-xCdxO Thin Films Deposited by dc Reactive Magnetron Sputtering |
MA De-Wei1;YE Zhi-Zhen1;HUANG Jing-Yun1;ZHAO Bing-Hui1;WAN Shou-Ke2;SUN Xue-Hao2;WANG Zhan-Guo2 |
1State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027
2Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083 |
|
Cite this article: |
MA De-Wei, YE Zhi-Zhen, HUANG Jing-Yun et al 2003 Chin. Phys. Lett. 20 942-943 |
|
|
Abstract Zn1-xCdxO crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. X-ray diffraction measurements show that the Zn1-xCdxO films are of completely (002)-preferred orientation for x ≤ 0.6. For x = 0.8, the film is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-xCdxO (x = 0.2) thin film has a red-shift of 0.14 eV from that of ZnO reported previously.
|
Keywords:
78.66.Hf
78.55.-m
61.10.Kw
81.15.Cd
|
|
Published: 01 June 2003
|
|
|
|
|
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|