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A Study of Field Electron Emission from Thin Amorphous-Carbon-Nitride Films |
| CHEN Jun1;XU Ning-sheng1,2;WANG En-ge2;DENG Shao-zhi1;CHEN Di-hu1;WEI Ai-xiang1 |
| 1Department of Physics, Zhongshan University, Guangzhou 510275
2State Key Laboratory for Surface Science, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
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| Cite this article: |
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CHEN Jun, XU Ning-sheng, WANG En-ge et al 1998 Chin. Phys. Lett. 15 539-541 |
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Abstract Significant field emission has been observed from thin (< 1000 Å) amorphous-carbon-nitride (a-CN) films. X-ray photoelectron spectroscopy, infrared spectrometry, and UV-visible optical absorption spectrometry have been used to characterize the films. The field emission properties of the thin film have been studied by using a transparent anode imaging system. It is proposed that this class of films should be studied as candidates of coating material for cold cathode emitter, in order for one to benefit from their very high thermal conductivity and super hardness.
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| Keywords:
79.70.+q
78.66.-w
79.60.Dp
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Published: 01 July 1998
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| PACS: |
79.70.+q
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(Field emission, ionization, evaporation, and desorption)
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78.66.-w
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(Optical properties of specific thin films)
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79.60.Dp
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(Adsorbed layers and thin films)
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