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Synthesis of β-FeSi2 Film by Reactive Deposition-Solid Phase Epitaxy |
WANG Lianwei;SHEN Qinwo;CHEN Xiangdong;LIN Xian;LIN Chenglu;ZOU Shichang |
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050 |
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Cite this article: |
WANG Lianwei, SHEN Qinwo, CHEN Xiangdong et al 1995 Chin. Phys. Lett. 12 301-304 |
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Abstract Reactive deposition-solid phase epitaxy has been developed for the epitaxial growth of thick β-FeSi2film. Compared with the solid phase epitaxy, the crystal quality was improved. The orientation relationship mainly depends on the depositing condition. Observation by transmission electron microscope revealed the polycrystalline nature and the mean crystallite size was about 200nm.
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Keywords:
68.55.Eg
68.55.Bd
68.55.Jk
68.55.Nq
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Published: 01 May 1995
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