Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate

Chin. Phys. Lett.

1991, Vol. 8

Issue (5): 244-247 DOI:

Original Articles

Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate

WANG Keming;SHI Borong;WANG Zhonglie;ZHAO Qingtai, LIU Xiangdong;LIU Jitian;LIU Yaogang^*

Department of Physics, Shandong University, Jinan 250100 ^*Institute of Crystal Material, Shandong University, Jinan 250100

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WANG Keming, SHI Borong, WANG Zhonglie et al 1991 Chin. Phys. Lett. 8 244-247

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Abstract 200keV Xe ions were implanted in potassium titanyl phosphate (KTP) at deferent angles: 0°, 45° and 60°. The lateral spread of Xe ions in KTP was studied by Rutherford backscattering of 2.1 MeV He ions. The result is compared with the theoretical prediction. The lateral spread is found in good agreement with calculated value within 17 %.

Keywords: 61.70.Vn

Published: 01 May 1991

PACS:

61.70.Vn

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1991/V8/I5/0244

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	WANG Keming
	SHI Borong
	WANG Zhonglie
	ZHAO Qingtai
	LIU Xiangdong
	LIU Jitian
	LIU Yaogang

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